EUV光刻光源之神奇一秒钟 EUV lithography – This all happens in one second

With the increasing global digitalization, requirements for computer performance continue to grow. The result: Chips have to be smaller and more efficient, which is why many more transistors have to fit on semiconductors. With EUV lithography, TRUMPF, in partnership with ASML and Zeiss, has developed a cost-efficient and mass-suitable process, during which the wafers are exposed to extreme ultraviolet (EUV) light at a wavelength of 13,5 nanometers. By this means, efficiency and profitability of production for chip manufacturers are increased. TRUMPF produces the laser pulse for the process, which is needed for the generation of EUV radiation. Therefore we developed an own, pulse-capable high-performance CO2 laser system